Stabilization of Silicon Carbide Whisker Suspensions: I, Influence of Surface Oxidation in Aqueous Suspensions

The extent of surface oxidation controls the stability of silicon carbide aqueous suspensions. In the present study, x-ray photon spectroscopy (XPS) was used to determine the extent of oxygen on as-received and oxidized silicon carbide whiskers. The isoelectric points at pH 6.0 and pH 4.0 for the as...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Advanced Ceramic Materials 1988-05, Vol.3 (3), p.231-234
Hauptverfasser: ADAIR, JAMES H., MUTSUDDY, BEEBHAS C., DRAUGLIS, E. J.
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The extent of surface oxidation controls the stability of silicon carbide aqueous suspensions. In the present study, x-ray photon spectroscopy (XPS) was used to determine the extent of oxygen on as-received and oxidized silicon carbide whiskers. The isoelectric points at pH 6.0 and pH 4.0 for the as-received and oxidized whiskers, respectively, correlated with the XPS analyses, indicating essentially a silica surface on the oxidized whiskers and both Si-O and Si-C bonds on the surface of the as-received whiskers. Suggestions are made regarding the utility of the oxidation treatment in processing whisker-reinforced ceramics.
ISSN:0883-5551
1551-2916
DOI:10.1111/j.1551-2916.1988.tb00207.x