Atmospheric Pressure Chemical Vapor Deposition of Crystalline Monoclinic WO3 and WO3 - x Thin Films from Reaction of WCl6 with O-Containing Solvents and Their Photochromic and Electrochromic Properties

The atmospheric pressure chemical vapor deposition (CVD) reaction of WCl6 with a variety of reactants (ethanoic anhydride, ethanoic acid, ethyl ethanoate, methanol, ethanol, 2-propanol, 2-methyl-2-propanol, and water) was examined on glass substrates. The deposited films displayed strikingly differe...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Chemistry of materials 2005-03, Vol.17 (6), p.1583-1590
Hauptverfasser: Blackman, Christopher S, Parkin, Ivan P
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The atmospheric pressure chemical vapor deposition (CVD) reaction of WCl6 with a variety of reactants (ethanoic anhydride, ethanoic acid, ethyl ethanoate, methanol, ethanol, 2-propanol, 2-methyl-2-propanol, and water) was examined on glass substrates. The deposited films displayed strikingly different morphologies with differing reactants under otherwise identical conditions. Full characterization revealed that the films were all monoclinic WO3, but the different morphologies lead to significant differences in the functional properties of the deposited films, such as photochromism and photocatalysis. The effects of the CVD parameters on deposited films were extensively studied for the reaction of WCl6 with ethanoic anhydride.
ISSN:0897-4756
1520-5002
DOI:10.1021/cm0403816