Kinetics of the SiH3 + H2O2 and SiH3 + O2 Reactions
The kinetics of the reaction of silyl radicals (SiH3) with H2O2 and O2 were studied using time-resolved infrared diode laser absorption spectroscopy. The rate constant SiH3 + H2O2 at 298 K was determined to be 9.8 × 10-12 cm3 molecule-1 s-1. This rate constant is independent of temperature over the...
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| Veröffentlicht in: | The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory Molecules, spectroscopy, kinetics, environment, & general theory, 2003-08, Vol.107 (31), p.5963-5967 |
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| Hauptverfasser: | , |
| Format: | Artikel |
| Sprache: | eng ; jpn |
| Online-Zugang: | Volltext |
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| Zusammenfassung: | The kinetics of the reaction of silyl radicals (SiH3) with H2O2 and O2 were studied using time-resolved infrared diode laser absorption spectroscopy. The rate constant SiH3 + H2O2 at 298 K was determined to be 9.8 × 10-12 cm3 molecule-1 s-1. This rate constant is independent of temperature over the range 298−573 K. The yield of OH products was quantified by reaction with CO to produce CO2, which was detected by infrared spectroscopy. The branching ratio of the SiH3 + H2O2 reaction into OH product channels was estimated to be |
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| ISSN: | 1089-5639 1520-5215 |
| DOI: | 10.1021/jp022262o |