Electrochemical and photoelectrochemical study of the selfassembled monolayer phytic acid on cupronickel B30

Purpose The purpose of this paper is to investigate the selfassembled monolayers SAMs of phytic acid on cupronickel B30 surface of anticorrosion and inhibiting mechanisms. Designmethodologyapproach Electrochemical and photocurrent response methods were performed to determine the effect of phytic acid SAMs on cupronickel B30. Findings The results indicated that phytic acid was liable to interact with B30 as a result of formation of complexes on B30 surface for antirust and anticorrosion. The SAMs changed the structure of the electrochemical double layer and made the value of double layer capacitance decrease significantly. The B30 electrode showed ptype photoresponse, which came from Cu2O layer on its surface. The photoresponse decreased greatly due to the SAMs of phytic acid as the corrosion resisting property was enhanced. This finding was in good agreement with the results obtained from EIS and polarization curves. Adsorption of phytic acid was found to follow the Langmuir adsorption isotherm and the adsorption mechanism was typical of chemisorption. Originalityvalue The SAMs of phytic acid on cupronickel B30 was gained for the first time. The photoelectrochemical method was an in situ method, which was effective for characterizing optical and electronic properties of passive films.