Controlling the threshold voltage of SnO2 nanowire transistors with dual in-plane-gate structures gated by chitosan proton conductors

We fabricated novel dual in-plane-gate electric-double-layer (EDL) SnO2 nanowire transistors gated by chitosan using only one transmission electron microscopy (TEM) nickel grid mask at room temperature, and we successfully controlled its threshold voltage. By changing the second in-plane gate bias from 1.0 to −1.0 V, we tuned the threshold voltage of these transistors from −0.35 to 0.21 V. Their operation voltage was 1.0 V, because the EDL gate dielectric can lead to high gate dielectric capacitance (4.24 µF/cm2). These dual in-plane-gate nanowire transistors could pave the way to useful low-voltage nanoelectronic devices.