Contribution of electrons, Ar(3P0,2), H2O+, and H3O+ to production of OH(A2Σ+) in a micro-dielectric barrier discharge of Ar/H2O

The numerical simulation of a micro-dielectric barrier discharge of an Ar/H2O gas mixture has been performed to understand the behavior of OH(A) in three-dimensionally integrated micro-solution plasma. During the discharge ignition sequence in the period of 0-200 ns, the major OH(A) production reactions are the dissociation of H2O by high-electron-temperature electrons and metastable excited Ar(3P). After the main discharge, OH(A) production is dominated by the dissociative recombination of H3O+ and low-electron-temperature electrons.