Responses of OH (X2Π) and OH (A2Σ+) to high-energy electrons of dielectric barrier discharge in plasma-assisted burner flame

We examined the responses of OH(X2Π) and OH(A2Σ+) in a premixed CH4 flame to high-energy electrons produced by a dielectric barrier discharge. The density of OH(X2Π) did not respond to the pulsed production of high-energy electrons; however, we observed a pulsed increase in the density of chemically...

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Veröffentlicht in:Japanese Journal of Applied Physics 2014-11, Vol.53 (11), p.110309
Hauptverfasser: Zaima, Kazunori, Sasaki, Koichi
Format: Artikel
Sprache:eng
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Zusammenfassung:We examined the responses of OH(X2Π) and OH(A2Σ+) in a premixed CH4 flame to high-energy electrons produced by a dielectric barrier discharge. The density of OH(X2Π) did not respond to the pulsed production of high-energy electrons; however, we observed a pulsed increase in the density of chemically produced OH(A2Σ+). In addition, we observed that OH(A2Σ+) produced at the same time as high-energy electrons had a lower rotational temperature. We discussed possible key reactions in plasma-assisted combustion on the basis of the experimental observation showing the production of cold OH(A2Σ+).
ISSN:0021-4922
1347-4065
DOI:10.7567/JJAP.53.110309