Responses of OH (X2Π) and OH (A2Σ+) to high-energy electrons of dielectric barrier discharge in plasma-assisted burner flame
We examined the responses of OH(X2Π) and OH(A2Σ+) in a premixed CH4 flame to high-energy electrons produced by a dielectric barrier discharge. The density of OH(X2Π) did not respond to the pulsed production of high-energy electrons; however, we observed a pulsed increase in the density of chemically...
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Veröffentlicht in: | Japanese Journal of Applied Physics 2014-11, Vol.53 (11), p.110309 |
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Hauptverfasser: | , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | We examined the responses of OH(X2Π) and OH(A2Σ+) in a premixed CH4 flame to high-energy electrons produced by a dielectric barrier discharge. The density of OH(X2Π) did not respond to the pulsed production of high-energy electrons; however, we observed a pulsed increase in the density of chemically produced OH(A2Σ+). In addition, we observed that OH(A2Σ+) produced at the same time as high-energy electrons had a lower rotational temperature. We discussed possible key reactions in plasma-assisted combustion on the basis of the experimental observation showing the production of cold OH(A2Σ+). |
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ISSN: | 0021-4922 1347-4065 |
DOI: | 10.7567/JJAP.53.110309 |