Robust formation of ferroelectric HfO2 films by Y2O3 sub-monolayer lamination

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Veröffentlicht in:	Applied physics express 2022-12, Vol.15 (12)
Hauptverfasser:	Mizutani, Kazuto, Hoshii, Takuya, Wakabayashi, Hitoshi, Tsutsui, Kazuo, Chang, Edward Y., Kakushima, Kuniyuki
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Sprache:	eng
Schlagworte:	ferroelectric HfO laminated
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container_issue	12
container_start_page
container_title	Applied physics express
container_volume	15
creator	Mizutani, Kazuto Hoshii, Takuya Wakabayashi, Hitoshi Tsutsui, Kazuo Chang, Edward Y. Kakushima, Kuniyuki
description
doi_str_mv	10.35848/1882-0786/ac9d20
format	Article
fullrecord	<record><control><sourceid>iop</sourceid><recordid>TN_cdi_iop_journals_10_35848_1882_0786_ac9d20</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>apexac9d20</sourcerecordid><originalsourceid>FETCH-LOGICAL-i337t-b06756b2cc75c2efc342c88462cc55f76bef8167cc8999f0156fb366781963943</originalsourceid><addsrcrecordid>eNptUE1LAzEUDKJgrf4Ab7l6iM3H5usoRa1QWRA9eApJmkDK7qZkd8H-e7et9CQMvGGY9x4zANwT_Mi4qtSCKEURlkosrNcbii_A7CxdnrlU1-Cm77cYi4oRMQPvH9mN_QBjLq0dUu5gjjCGUnJogh9K8nAVawpjatoeuj38pjWD_ehQm7vc2H0osLFt6o7Lt-Aq2qYPd39zDr5enj-XK7SuX9-WT2uUGJMDclhILhz1XnJPQ_Ssol6pSkwK51EKF6IiQnqvtNYREy6iY0JIRbRgumJzgE53U96ZbR5LN30zBJtjF-YQ1hyCm1MXk__hH7_dhR9DuCF0AsGYmt0msl9Qr1-U</addsrcrecordid><sourcetype>Enrichment Source</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Robust formation of ferroelectric HfO2 films by Y2O3 sub-monolayer lamination</title><source>IOP Publishing Journals</source><source>Institute of Physics (IOP) Journals - HEAL-Link</source><creator>Mizutani, Kazuto ; Hoshii, Takuya ; Wakabayashi, Hitoshi ; Tsutsui, Kazuo ; Chang, Edward Y. ; Kakushima, Kuniyuki</creator><creatorcontrib>Mizutani, Kazuto ; Hoshii, Takuya ; Wakabayashi, Hitoshi ; Tsutsui, Kazuo ; Chang, Edward Y. ; Kakushima, Kuniyuki</creatorcontrib><identifier>ISSN: 1882-0778</identifier><identifier>EISSN: 1882-0786</identifier><identifier>DOI: 10.35848/1882-0786/ac9d20</identifier><identifier>CODEN: APEPC4</identifier><language>eng</language><publisher>IOP Publishing</publisher><subject>ferroelectric ; HfO ; laminated</subject><ispartof>Applied physics express, 2022-12, Vol.15 (12)</ispartof><rights>2022 The Japan Society of Applied Physics</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><orcidid>0000-0002-2873-8715</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://iopscience.iop.org/article/10.35848/1882-0786/ac9d20/pdf$$EPDF$$P50$$Giop$$H</linktopdf><link.rule.ids>314,776,780,27901,27902,53821,53868</link.rule.ids></links><search><creatorcontrib>Mizutani, Kazuto</creatorcontrib><creatorcontrib>Hoshii, Takuya</creatorcontrib><creatorcontrib>Wakabayashi, Hitoshi</creatorcontrib><creatorcontrib>Tsutsui, Kazuo</creatorcontrib><creatorcontrib>Chang, Edward Y.</creatorcontrib><creatorcontrib>Kakushima, Kuniyuki</creatorcontrib><title>Robust formation of ferroelectric HfO2 films by Y2O3 sub-monolayer lamination</title><title>Applied physics express</title><addtitle>Appl. Phys. Express</addtitle><subject>ferroelectric</subject><subject>HfO</subject><subject>laminated</subject><issn>1882-0778</issn><issn>1882-0786</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2022</creationdate><recordtype>article</recordtype><sourceid/><recordid>eNptUE1LAzEUDKJgrf4Ab7l6iM3H5usoRa1QWRA9eApJmkDK7qZkd8H-e7et9CQMvGGY9x4zANwT_Mi4qtSCKEURlkosrNcbii_A7CxdnrlU1-Cm77cYi4oRMQPvH9mN_QBjLq0dUu5gjjCGUnJogh9K8nAVawpjatoeuj38pjWD_ehQm7vc2H0osLFt6o7Lt-Aq2qYPd39zDr5enj-XK7SuX9-WT2uUGJMDclhILhz1XnJPQ_Ssol6pSkwK51EKF6IiQnqvtNYREy6iY0JIRbRgumJzgE53U96ZbR5LN30zBJtjF-YQ1hyCm1MXk__hH7_dhR9DuCF0AsGYmt0msl9Qr1-U</recordid><startdate>20221201</startdate><enddate>20221201</enddate><creator>Mizutani, Kazuto</creator><creator>Hoshii, Takuya</creator><creator>Wakabayashi, Hitoshi</creator><creator>Tsutsui, Kazuo</creator><creator>Chang, Edward Y.</creator><creator>Kakushima, Kuniyuki</creator><general>IOP Publishing</general><scope/><orcidid>https://orcid.org/0000-0002-2873-8715</orcidid></search><sort><creationdate>20221201</creationdate><title>Robust formation of ferroelectric HfO2 films by Y2O3 sub-monolayer lamination</title><author>Mizutani, Kazuto ; Hoshii, Takuya ; Wakabayashi, Hitoshi ; Tsutsui, Kazuo ; Chang, Edward Y. ; Kakushima, Kuniyuki</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i337t-b06756b2cc75c2efc342c88462cc55f76bef8167cc8999f0156fb366781963943</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2022</creationdate><topic>ferroelectric</topic><topic>HfO</topic><topic>laminated</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Mizutani, Kazuto</creatorcontrib><creatorcontrib>Hoshii, Takuya</creatorcontrib><creatorcontrib>Wakabayashi, Hitoshi</creatorcontrib><creatorcontrib>Tsutsui, Kazuo</creatorcontrib><creatorcontrib>Chang, Edward Y.</creatorcontrib><creatorcontrib>Kakushima, Kuniyuki</creatorcontrib><jtitle>Applied physics express</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Mizutani, Kazuto</au><au>Hoshii, Takuya</au><au>Wakabayashi, Hitoshi</au><au>Tsutsui, Kazuo</au><au>Chang, Edward Y.</au><au>Kakushima, Kuniyuki</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Robust formation of ferroelectric HfO2 films by Y2O3 sub-monolayer lamination</atitle><jtitle>Applied physics express</jtitle><addtitle>Appl. Phys. Express</addtitle><date>2022-12-01</date><risdate>2022</risdate><volume>15</volume><issue>12</issue><issn>1882-0778</issn><eissn>1882-0786</eissn><coden>APEPC4</coden><pub>IOP Publishing</pub><doi>10.35848/1882-0786/ac9d20</doi><tpages>5</tpages><orcidid>https://orcid.org/0000-0002-2873-8715</orcidid></addata></record>
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issn	1882-0778 1882-0786
language	eng
recordid	cdi_iop_journals_10_35848_1882_0786_ac9d20
source	IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link
subjects	ferroelectric HfO laminated
title	Robust formation of ferroelectric HfO2 films by Y2O3 sub-monolayer lamination
url	https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-09T05%3A42%3A57IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-iop&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Robust%20formation%20of%20ferroelectric%20HfO2%20films%20by%20Y2O3%20sub-monolayer%20lamination&rft.jtitle=Applied%20physics%20express&rft.au=Mizutani,%20Kazuto&rft.date=2022-12-01&rft.volume=15&rft.issue=12&rft.issn=1882-0778&rft.eissn=1882-0786&rft.coden=APEPC4&rft_id=info:doi/10.35848/1882-0786/ac9d20&rft_dat=%3Ciop%3Eapexac9d20%3C/iop%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true