The ferroelectric and piezoelectric properties of (Hf1−x Ce x )O2 films on indium tin oxide/Pt/TiO x /SiO2/(100)Si substrates obtained using a no-heating radio-frequency magnetron sputtering deposition method

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Veröffentlicht in:	Japanese Journal of Applied Physics 2024-04, Vol.63 (4)
Hauptverfasser:	Chaya, Nachi, Okamoto, Kazuki, Hirai, Koji, Yasuoka, Shinnosuke, Inoue, Yukari, Yamaoka, Wakiko, Funakubo, Hiroshi
Format:	Artikel
Sprache:	eng
Schlagworte:	based films ferroelectric HfO no-heating processes RF magnetron sputtering method thick films
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source	IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link
subjects	based films ferroelectric HfO no-heating processes RF magnetron sputtering method thick films
title	The ferroelectric and piezoelectric properties of (Hf1−x Ce x )O2 films on indium tin oxide/Pt/TiO x /SiO2/(100)Si substrates obtained using a no-heating radio-frequency magnetron sputtering deposition method
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