Radical-Induced Effect on PEALD SiO2 Films by Applying Positive DC Bias

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Veröffentlicht in:	ECS journal of solid state science and technology 2022-02, Vol.11 (2)
Hauptverfasser:	Park, Suhyeon, Park, Taehun, Choi, Yeongtae, Jung, Chanwon, Kim, Byunguk, Jeon, Hyeongtag
Format:	Artikel
Sprache:	eng
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title	Radical-Induced Effect on PEALD SiO2 Films by Applying Positive DC Bias
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