Indium Tin Oxide - Silicon Nanocrystal Nanocomposite Grown by Aerosol-Assisted Chemical Vapour Deposition

Nanocomposite films were grown by aerosol-assisted chemical vapour deposition in a single deposition process using a mixture of indium tin neodecanoate and ligand stabilized silicon nanocrystals dispersed in a solvent. Samples were analysed by HRTEM and silicon nanocrystals with a density of 1.2 x 1...

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Veröffentlicht in:ECS transactions 2015-07, Vol.66 (15), p.17-21
Hauptverfasser: O'Brien, S, Linehan, K, Doyle, H, Kingsley, A, Ashfield, C, Frank, B, Xie, L, Leifer, K, Thony, P, Perraud, S, Pemble, M E, Povey, I. M
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Sprache:eng
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Zusammenfassung:Nanocomposite films were grown by aerosol-assisted chemical vapour deposition in a single deposition process using a mixture of indium tin neodecanoate and ligand stabilized silicon nanocrystals dispersed in a solvent. Samples were analysed by HRTEM and silicon nanocrystals with a density of 1.2 x 1012 cm-2 were observed. From the reconstructed 3D tomogram, the averaged distance between the nearest nanoparticles is 8.3nm and the 3D density of nanoparticles is 1.6 x 1018 cm-3. These data show the versatility of aerosol-assisted CVD in achieving a high density of nanocrystals within a polycrystalline host-matrix, meeting the density and size distribution requirements for particle inclusion in active nanocomposites for photovoltaic applications.
ISSN:1938-5862
1938-6737
DOI:10.1149/06615.0017ecst