Indium Tin Oxide - Silicon Nanocrystal Nanocomposite Grown by Aerosol-Assisted Chemical Vapour Deposition
Nanocomposite films were grown by aerosol-assisted chemical vapour deposition in a single deposition process using a mixture of indium tin neodecanoate and ligand stabilized silicon nanocrystals dispersed in a solvent. Samples were analysed by HRTEM and silicon nanocrystals with a density of 1.2 x 1...
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Veröffentlicht in: | ECS transactions 2015-07, Vol.66 (15), p.17-21 |
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Hauptverfasser: | , , , , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
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Zusammenfassung: | Nanocomposite films were grown by aerosol-assisted chemical vapour deposition in a single deposition process using a mixture of indium tin neodecanoate and ligand stabilized silicon nanocrystals dispersed in a solvent. Samples were analysed by HRTEM and silicon nanocrystals with a density of 1.2 x 1012 cm-2 were observed. From the reconstructed 3D tomogram, the averaged distance between the nearest nanoparticles is 8.3nm and the 3D density of nanoparticles is 1.6 x 1018 cm-3. These data show the versatility of aerosol-assisted CVD in achieving a high density of nanocrystals within a polycrystalline host-matrix, meeting the density and size distribution requirements for particle inclusion in active nanocomposites for photovoltaic applications. |
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ISSN: | 1938-5862 1938-6737 |
DOI: | 10.1149/06615.0017ecst |