Structure, mechanical and tribological properties of TiSiC films deposited by magnetron sputtering segment target

In this work, the TiSiC films were deposited by magnetron sputtering segment target with various areal ratio of Ti80Si20 to C. The effects of segment target component on the structure, mechanical and tribological properties of the films were investigated. The results revealed that the deposited film...

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Veröffentlicht in:Materials research express 2017-12, Vol.4 (12), p.126401
Hauptverfasser: Jiang, Jinlong, He, Kaichen, He, XingXing, Huang, Hao, Pang, Xianjuan, Wei, Zhiqiang
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Sprache:eng
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Zusammenfassung:In this work, the TiSiC films were deposited by magnetron sputtering segment target with various areal ratio of Ti80Si20 to C. The effects of segment target component on the structure, mechanical and tribological properties of the films were investigated. The results revealed that the deposited films exhibited a structural transform from a cubic TiC structure to a nanocomposite structure with nanocrystalline TiC in a-C:Si matrix, and finally x-ray amorphous structures with decreasing areal ratio of Ti80Si20 to C. The TiSiC film deposited at the Ti80Si20:C areal ratio of 7:7 showed superior mechanical and tribological properties such as high hardness (18.6 Gpa), good scratch resistant (46 N), low friction coefficient (0.2) and low wear rate (8.6  ×  10−7 mm3 Nm−1), which suggests that it is a promising candidate for the protective films.
ISSN:2053-1591
2053-1591
DOI:10.1088/2053-1591/aa9ae6