Dielectric particle lofting from dielectric substrate exposed to low-energy electron beam
The particle-in-cell simulation is applied to study a nanometer-sized dielectric particle lofting from a dielectric substrate exposed to a low-energy electron beam. The article discusses the electron accumulation between a substrate and a particle lying on it, which can cause the particle lofting. T...
Gespeichert in:
| Veröffentlicht in: | Plasma sources science & technology 2020-08, Vol.29 (8), p.85013 |
|---|---|
| Hauptverfasser: | , , , , , , |
| Format: | Artikel |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | 8 |
| container_start_page | 85013 |
| container_title | Plasma sources science & technology |
| container_volume | 29 |
| creator | Krainov, P V Ivanov, V V Astakhov, D I Medvedev, V V Kvon, V V Yakunin, A M van de Kerkhof, M A |
| description | The particle-in-cell simulation is applied to study a nanometer-sized dielectric particle lofting from a dielectric substrate exposed to a low-energy electron beam. The article discusses the electron accumulation between a substrate and a particle lying on it, which can cause the particle lofting. The results are of interest for dust mitigation in the semiconductor industry, the lunar exploration, and the explanation of the dust levitation. |
| doi_str_mv | 10.1088/1361-6595/aba58b |
| format | Article |
| fullrecord | <record><control><sourceid>iop_cross</sourceid><recordid>TN_cdi_iop_journals_10_1088_1361_6595_aba58b</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>psstaba58b</sourcerecordid><originalsourceid>FETCH-LOGICAL-c280t-f463d2ce092236abb89d4625712f4633c9556c5c3b71c1cbf9b9d5fcaf26dda23</originalsourceid><addsrcrecordid>eNp1kMtKxDAUhoMoWEf3LvMAxsllkjZLGa8w4EYXrkKuQ4e2KUkGnbd3SkVXrg785_sPhw-Aa4JvCW6aJWGCIMElX2qjeWNOQPUbnYIKS8EQppyeg4ucdxgT0tC6Ah_3re-8Lam1cNSptLbzsIuhtMMWhhR76P6AvDe5JF089F9jzN7BEo_wJ_KDT9sDnME4QON1fwnOgu6yv_qZC_D--PC2fkab16eX9d0GWdrggsJKMEetx5JSJrQxjXQrQXlN6LRiVnIuLLfM1MQSa4I00vFgdaDCOU3ZAuD5rk0x5-SDGlPb63RQBKtJjZo8qMmDmtUcKzdzpY2j2sV9Go4P_o9_A5ViZ6s</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Dielectric particle lofting from dielectric substrate exposed to low-energy electron beam</title><source>IOP Publishing Journals</source><source>Institute of Physics (IOP) Journals - HEAL-Link</source><creator>Krainov, P V ; Ivanov, V V ; Astakhov, D I ; Medvedev, V V ; Kvon, V V ; Yakunin, A M ; van de Kerkhof, M A</creator><creatorcontrib>Krainov, P V ; Ivanov, V V ; Astakhov, D I ; Medvedev, V V ; Kvon, V V ; Yakunin, A M ; van de Kerkhof, M A</creatorcontrib><description>The particle-in-cell simulation is applied to study a nanometer-sized dielectric particle lofting from a dielectric substrate exposed to a low-energy electron beam. The article discusses the electron accumulation between a substrate and a particle lying on it, which can cause the particle lofting. The results are of interest for dust mitigation in the semiconductor industry, the lunar exploration, and the explanation of the dust levitation.</description><identifier>ISSN: 0963-0252</identifier><identifier>ISSN: 1361-6595</identifier><identifier>EISSN: 1361-6595</identifier><identifier>DOI: 10.1088/1361-6595/aba58b</identifier><identifier>CODEN: PSTEEU</identifier><language>eng</language><publisher>IOP Publishing</publisher><subject>dust lofting ; dust transport in plasma ; electron beam ; plasma sheath</subject><ispartof>Plasma sources science & technology, 2020-08, Vol.29 (8), p.85013</ispartof><rights>2020 IOP Publishing Ltd</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c280t-f463d2ce092236abb89d4625712f4633c9556c5c3b71c1cbf9b9d5fcaf26dda23</citedby><cites>FETCH-LOGICAL-c280t-f463d2ce092236abb89d4625712f4633c9556c5c3b71c1cbf9b9d5fcaf26dda23</cites><orcidid>0000-0003-2094-9478</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://iopscience.iop.org/article/10.1088/1361-6595/aba58b/pdf$$EPDF$$P50$$Giop$$H</linktopdf><link.rule.ids>314,780,784,27924,27925,53846,53893</link.rule.ids></links><search><creatorcontrib>Krainov, P V</creatorcontrib><creatorcontrib>Ivanov, V V</creatorcontrib><creatorcontrib>Astakhov, D I</creatorcontrib><creatorcontrib>Medvedev, V V</creatorcontrib><creatorcontrib>Kvon, V V</creatorcontrib><creatorcontrib>Yakunin, A M</creatorcontrib><creatorcontrib>van de Kerkhof, M A</creatorcontrib><title>Dielectric particle lofting from dielectric substrate exposed to low-energy electron beam</title><title>Plasma sources science & technology</title><addtitle>PSST</addtitle><addtitle>Plasma Sources Sci. Technol</addtitle><description>The particle-in-cell simulation is applied to study a nanometer-sized dielectric particle lofting from a dielectric substrate exposed to a low-energy electron beam. The article discusses the electron accumulation between a substrate and a particle lying on it, which can cause the particle lofting. The results are of interest for dust mitigation in the semiconductor industry, the lunar exploration, and the explanation of the dust levitation.</description><subject>dust lofting</subject><subject>dust transport in plasma</subject><subject>electron beam</subject><subject>plasma sheath</subject><issn>0963-0252</issn><issn>1361-6595</issn><issn>1361-6595</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2020</creationdate><recordtype>article</recordtype><recordid>eNp1kMtKxDAUhoMoWEf3LvMAxsllkjZLGa8w4EYXrkKuQ4e2KUkGnbd3SkVXrg785_sPhw-Aa4JvCW6aJWGCIMElX2qjeWNOQPUbnYIKS8EQppyeg4ucdxgT0tC6Ah_3re-8Lam1cNSptLbzsIuhtMMWhhR76P6AvDe5JF089F9jzN7BEo_wJ_KDT9sDnME4QON1fwnOgu6yv_qZC_D--PC2fkab16eX9d0GWdrggsJKMEetx5JSJrQxjXQrQXlN6LRiVnIuLLfM1MQSa4I00vFgdaDCOU3ZAuD5rk0x5-SDGlPb63RQBKtJjZo8qMmDmtUcKzdzpY2j2sV9Go4P_o9_A5ViZ6s</recordid><startdate>20200818</startdate><enddate>20200818</enddate><creator>Krainov, P V</creator><creator>Ivanov, V V</creator><creator>Astakhov, D I</creator><creator>Medvedev, V V</creator><creator>Kvon, V V</creator><creator>Yakunin, A M</creator><creator>van de Kerkhof, M A</creator><general>IOP Publishing</general><scope>AAYXX</scope><scope>CITATION</scope><orcidid>https://orcid.org/0000-0003-2094-9478</orcidid></search><sort><creationdate>20200818</creationdate><title>Dielectric particle lofting from dielectric substrate exposed to low-energy electron beam</title><author>Krainov, P V ; Ivanov, V V ; Astakhov, D I ; Medvedev, V V ; Kvon, V V ; Yakunin, A M ; van de Kerkhof, M A</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c280t-f463d2ce092236abb89d4625712f4633c9556c5c3b71c1cbf9b9d5fcaf26dda23</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2020</creationdate><topic>dust lofting</topic><topic>dust transport in plasma</topic><topic>electron beam</topic><topic>plasma sheath</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Krainov, P V</creatorcontrib><creatorcontrib>Ivanov, V V</creatorcontrib><creatorcontrib>Astakhov, D I</creatorcontrib><creatorcontrib>Medvedev, V V</creatorcontrib><creatorcontrib>Kvon, V V</creatorcontrib><creatorcontrib>Yakunin, A M</creatorcontrib><creatorcontrib>van de Kerkhof, M A</creatorcontrib><collection>CrossRef</collection><jtitle>Plasma sources science & technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Krainov, P V</au><au>Ivanov, V V</au><au>Astakhov, D I</au><au>Medvedev, V V</au><au>Kvon, V V</au><au>Yakunin, A M</au><au>van de Kerkhof, M A</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Dielectric particle lofting from dielectric substrate exposed to low-energy electron beam</atitle><jtitle>Plasma sources science & technology</jtitle><stitle>PSST</stitle><addtitle>Plasma Sources Sci. Technol</addtitle><date>2020-08-18</date><risdate>2020</risdate><volume>29</volume><issue>8</issue><spage>85013</spage><pages>85013-</pages><issn>0963-0252</issn><issn>1361-6595</issn><eissn>1361-6595</eissn><coden>PSTEEU</coden><abstract>The particle-in-cell simulation is applied to study a nanometer-sized dielectric particle lofting from a dielectric substrate exposed to a low-energy electron beam. The article discusses the electron accumulation between a substrate and a particle lying on it, which can cause the particle lofting. The results are of interest for dust mitigation in the semiconductor industry, the lunar exploration, and the explanation of the dust levitation.</abstract><pub>IOP Publishing</pub><doi>10.1088/1361-6595/aba58b</doi><tpages>8</tpages><orcidid>https://orcid.org/0000-0003-2094-9478</orcidid></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0963-0252 |
| ispartof | Plasma sources science & technology, 2020-08, Vol.29 (8), p.85013 |
| issn | 0963-0252 1361-6595 1361-6595 |
| language | eng |
| recordid | cdi_iop_journals_10_1088_1361_6595_aba58b |
| source | IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link |
| subjects | dust lofting dust transport in plasma electron beam plasma sheath |
| title | Dielectric particle lofting from dielectric substrate exposed to low-energy electron beam |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-20T00%3A50%3A04IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-iop_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Dielectric%20particle%20lofting%20from%20dielectric%20substrate%20exposed%20to%20low-energy%20electron%20beam&rft.jtitle=Plasma%20sources%20science%20&%20technology&rft.au=Krainov,%20P%20V&rft.date=2020-08-18&rft.volume=29&rft.issue=8&rft.spage=85013&rft.pages=85013-&rft.issn=0963-0252&rft.eissn=1361-6595&rft.coden=PSTEEU&rft_id=info:doi/10.1088/1361-6595/aba58b&rft_dat=%3Ciop_cross%3Epsstaba58b%3C/iop_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |