Transparent HfOx-based memristor with robust flexibility and synapse characteristics by interfacial control of oxygen vacancies movement

Hafnium oxides (HfOx) based flexible memristors were fabricated on polyethylene naphtholate (PEN) substrates to simulate a variety of bio-synapse functions. By optimizing the manufacturing conditions of electrode and active films, it is proved that the TiN/HfOx/W/ITO/PEN bilayer device has robust flexibility and can still be modulated after 2000 times of bending. The memristor device exhibits better symmetrical and linear characteristics with excellent uniformity at lower programming power consumption (∼38 W). In addition, the essential synaptic behaviors have further been achieved in the devices, including the transition from short-term plasticity to long-term plasticity and spike time-dependent plasticity. Through the analysis of I-V curves and XPS data, a switching mechanism based on HfOx/W interface boundary drift is constructed. It is revealed that the redox reaction caused by W intercalation can effectively regulate the content of oxygen vacancy in HfOx. At the same time, bias-induced interfacial reactions will regulate the movement of oxygen vacancies, which emulates bio-synapse functions and improves the electrical properties of the device.