Surface localisation of laser photoelectron emission using Cu2O and Ag film structures

A laser electron source localised on a photocathode surface was developed on the basis of Ag and Cu2O thin films sequentially deposited by magnetron sputtering on a glass substrate. Photoemission of electrons under the action of the fourth (263 nm) harmonic of a femtosecond fibre laser was initiated...

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Veröffentlicht in:Quantum electronics (Woodbury, N.Y.) N.Y.), 2018-10, Vol.48 (10), p.977-982
Hauptverfasser: Andreev, S.V., Danilov, P.A., Kudryashov, S.I., Ryabov, E.A.
Format: Artikel
Sprache:eng
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Zusammenfassung:A laser electron source localised on a photocathode surface was developed on the basis of Ag and Cu2O thin films sequentially deposited by magnetron sputtering on a glass substrate. Photoemission of electrons under the action of the fourth (263 nm) harmonic of a femtosecond fibre laser was initiated from the surface of an Ag film deposited on the substrate surface. Photoelectron source localisation on the photocathode surface was provided by sputtering the Cu2O copper oxide film on its surface, which significantly (about 50 times) reduced the photoemission efficiency, and by subsequent removal of the copper oxide layer in the photoemission spot with a diameter of ∼15 μm by means of focused second-harmonic radiation of a femtosecond fibre laser. In conducting research on the photocathode surface, a grid of photoemission spots was formed, which greatly facilitated the laser beam alignment with the photoemission spot. A decrease in the noises of ultrafast transmission electron microscope, associated with spatial fluctuations of the laser beam initiating pulsed photoelectron emission from the microscope photocathode when using a localised electron source on the basis of a structure of thin Cu2O and Ag films, was experimentally demonstrated.
ISSN:1063-7818
1468-4799
DOI:10.1070/QEL16754