Iridium thin film as a bottom electrode for high dielectric (Ba,Sr)TiO3 capacitors
We propose Ir thin films as new electrode materials for high dielectric BST capacitors. Ir was found to be superior to Pt in a number of aspects such as resistivity, adhesion and surface roughness. The Pt/BST/Ir/SiO 2 /Si capacitors showed leakage currents as low as Pt/BST/Pt/SiO 2 /Si ones, but hig...
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Veröffentlicht in: | Integrated ferroelectrics 1997-09, Vol.17 (1-4), p.187-195 |
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Hauptverfasser: | , , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | We propose Ir thin films as new electrode materials for high dielectric BST capacitors. Ir was found to be superior to Pt in a number of aspects such as resistivity, adhesion and surface roughness. The Pt/BST/Ir/SiO
2
/Si capacitors showed leakage currents as low as Pt/BST/Pt/SiO
2
/Si ones, but higher capacitance resulted. For endurance properties with +5V unipolar pulse trains, the dielectric constant of BST films on Ir decreased by only 10% below its initial value after switching of 10
9
cycles while that on Pt degraded by 30% after 10
8
cycles. Ir bottom electrode effects on BST film properties were well explained by the formation of IrO
2
phases on the surface of Ir electrodes. |
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ISSN: | 1058-4587 1607-8489 |
DOI: | 10.1080/10584589708012993 |