Precursor design for liquid Injection CVD of lead scandium tantalate thin films

Liquid Injection Chemical Vapour Deposition is a technique well suited to the deposition of a range of ferroelectric oxides in thin film form. This paper reports on the design and optimisation of the precursors for the deposition of thin films of the promising pyroelectric material, lead scandium tantalate. The design and use of lead, scandium and tantalum precursors with carefully matched chemical and thermal properties allows the growth of thin films with the required perovskite phase above 550°C. These have the desired 111 orientation when grown on to platinum coated silicon substrates at temperatures above 575°C.