Formation of oxide films by dynamic mixing

The dynamic mixing method, (or IVD one), which is one method of the coating film formation and has been developed by the present author and his collaborators, is introduced. The principle of this method is that the films are produced by vapor deposition and simultaneous bombardment of ions with energy 200eV-40keV and this method has various advantages, such as quick preparation of films, strong adhesion between film and substrate, preparation of thick films and that at low temperature. As an example, the formation of ITO (indium-tin oxide) films, which has the good transmittance for visible light and electric conductivity, and the properties are discussed. The preparation temperature is lower than 50°C. The films with the transmittance of 96% for light of the wave length 6000 Å and for the film thickness of about 500 Å and the electric resistivity of 1 × 10 −2 ω · cm are obtained.