Radiation-induced Electron Migration in Nucleic Acids

Radiation-induced electron migration along DNA is a mechanism by which randomly produced stochastic energy deposition events can lead to non-random types of damage along DNA manifested distal to the sites of the inital energy deposition. Radiation-induced electron migration in nucleic acids has been...

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Veröffentlicht in:International journal of radiation biology 1994, Vol.66 (5), p.505-509
Hauptverfasser: Fuciarelli, A.F., Sisk, E.C., Miller, J.H., Zimbrick, J.D.
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Sprache:eng
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Zusammenfassung:Radiation-induced electron migration along DNA is a mechanism by which randomly produced stochastic energy deposition events can lead to non-random types of damage along DNA manifested distal to the sites of the inital energy deposition. Radiation-induced electron migration in nucleic acids has been examined using oligonucleotides containing 5-bromouracil (5-BrU). Interaction of 5-BrU with solvated electrons results in release of bromide ions and formation of uracil-5-yl radicals. Monitoring either bromide ion release or uracil formation provides an opportunity to study electron migration processes in model nucleic acid systems. Using this approach we have discovered that electron migration along oligonucleotides is significantly influenced by the base sequence and strandedness. Migration along 7 base pairs in oligonucleotides containing guanine bases was observed for oligonucleotides irradiated in solution, which compares with mean migration distances of 6-10 bp for Escherichia coli DNA irradiated in solution and 5·5 bp for E. coli DNA irradiated in cells. Evidence also suggests that electron migration can occur preferentially in the 5′ to 3′ direction along a double-stranded oligonucleotide containing a region of purine bases adjacent to the 5-BrU moiety. Our continued efforts will provide information regarding the contribution of electron transfer along DNA to formation of locally multiply damaged sites created in DNA by exposure to ionizing radiation.
ISSN:0955-3002
1362-3095
DOI:10.1080/09553009414551531