The influence of erbium on the physical properties of GaN crystals grown from N solution in Ga at high nitrogen pressure

Oxygen contamination is the main source of free electrons in bulk GaN grown at high-pressure. We used erbium as a promising getter/compensation center to reduce the electron content in GaN. Both optical and electrical measurements indicate the reduction of electron concentration from the initial 6 ×...

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Veröffentlicht in:High pressure research 2000-09, Vol.18 (1-6), p.35-39
Hauptverfasser: Teisseyre, H., Ochalski, T. J., Perlin, P., Suski, T., Leszczynski, M., Grzegory, I., Boćkowski, M., Łucznik, B., Bugajski, M., Palczewska, M., Gebicki, W.
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Sprache:eng
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Zusammenfassung:Oxygen contamination is the main source of free electrons in bulk GaN grown at high-pressure. We used erbium as a promising getter/compensation center to reduce the electron content in GaN. Both optical and electrical measurements indicate the reduction of electron concentration from the initial 6 × 10 19 cm −3 down to 1 × 10 19 cm −3 . A photoluminescence study proves that erbium is incorporated into the GaN host lattice, and emits light at ∼ 1.5μm.
ISSN:0895-7959
1477-2299
DOI:10.1080/08957950008200945