Plasma treatment induced changes of dissolution kinetics of chromium

Exposures of chromium films to argon and freon 114 plasmas were found to modify chromium dissolution kinetics which was measured by following the removal of an implanted radioactive marker during gradual dissolution. The effect is attributed to surface layers (oxide and fluoride) formed by sputterin...

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Veröffentlicht in:	Radiation effects 1984-01, Vol.86 (4), p.121-125
1. Verfasser:	Jech, C.
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Cross-disciplinary physics: materials science rheology Cutting Exact sciences and technology Materials science Metals, semimetals and alloys Metals. Metallurgy Other machining methods Physics Production techniques Specific materials
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Beschreibung
Zusammenfassung:	Exposures of chromium films to argon and freon 114 plasmas were found to modify chromium dissolution kinetics which was measured by following the removal of an implanted radioactive marker during gradual dissolution. The effect is attributed to surface layers (oxide and fluoride) formed by sputtering and plasma reactions. A possible application of this effect in manufacturing fine structure chromium masks through wet chemical etching is indicated.
ISSN:	0033-7579 2331-3455
DOI:	10.1080/01422448408209705