F and F2 centres in LiF induced by ion implantation
Ion implantation has been used to colour LiF crystals at room temperature. Concentrations of the different colour centres (mainly F and F 2 centres) have been monitored through optical absorption measurements. Ion doses from 5 × 10 12 to 10 16 ion cm −2 lead to defect concentrations reaching × 10 −3...
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Veröffentlicht in: | Radiation effects 1986-09, Vol.98 (1-4), p.313-317 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | Ion implantation has been used to colour LiF crystals at room temperature. Concentrations of the different colour centres (mainly F and F
2
centres) have been monitored through optical absorption measurements. Ion doses from 5 × 10
12
to 10
16
ion cm
−2
lead to defect concentrations reaching × 10
−3
of the halogen sites. Measurements at the wavelengths of the F and F
2
absorption bands have shown an apparent power relation of F
2
= KF
1.4
. This empirical relation is found to hold for all the different implantations used. However, reappraisal of the data, allowing for overlapping absorption features, brings the F/F
2
kinetics back to the normal relationship of F
2
= KF
2
. The K values are closely related to the electronic stopping power for proton irradiations and vary as E
−0.67
. |
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ISSN: | 0033-7579 |
DOI: | 10.1080/00337578608206122 |