Design of circular waveguide transition with circular profile in electron cyclotron resonance plasma etching system
A circular waveguide transition for 2.45 GHz ECR (electron cyclotron resonance) plasma etching system is designed. This circular waveguide transition is constructed in its longitudinal profile by two circular curves. In addition, two circular curves tangent values are continuous at the connected poi...
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| Format: | Tagungsbericht |
| Sprache: | eng |
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| Zusammenfassung: | A circular waveguide transition for 2.45 GHz ECR (electron cyclotron resonance) plasma etching system is designed. This circular waveguide transition is constructed in its longitudinal profile by two circular curves. In addition, two circular curves tangent values are continuous at the connected point. The magnitude of the electric field at the output of the waveguide transition for three different curvature values are investigated. The best field uniformity of electric field in the case we discussed is found. |
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| DOI: | 10.1109/APMC.2001.985433 |