New method of extraction of systematic failure component
We propose a novel model, which can describe systematic faults and is applicable to process improvement. In this model, the histogram of the faults is described as the sum of the Poisson distribution and the negative binomial distribution. The latter originates from the systematic failure component....
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creator | Mitsutake, K. Ushiku, Y. Arakawa, Y. Ishibumi, T. Ito, O. |
description | We propose a novel model, which can describe systematic faults and is applicable to process improvement. In this model, the histogram of the faults is described as the sum of the Poisson distribution and the negative binomial distribution. The latter originates from the systematic failure component. By combining the analysis of the degree and the position of the systematic fault with a lot history, the problem of the processes can be solved. In this way, it is possible to enhance yield and increase productivity. |
doi_str_mv | 10.1109/ISSM.2001.962959 |
format | Conference Proceeding |
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In this way, it is possible to enhance yield and increase productivity.</description><subject>Histograms</subject><subject>History</subject><subject>Indium tin oxide</subject><subject>Manufacturing processes</subject><subject>Optimization methods</subject><subject>Production</subject><subject>Productivity</subject><subject>Redundancy</subject><subject>Semiconductor device manufacture</subject><subject>Virtual manufacturing</subject><isbn>0780367316</isbn><isbn>9780780367319</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2001</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><sourceid>RIE</sourceid><recordid>eNotj0tLAzEURgMiqG334ip_YMZk8rxLKT4K1S6q63JncoORzkyZRLT_XqV-m8PZHPgYu5aillLA7Wq7fa4bIWQNtgEDZ-xKOC-UdUraC7bI-UP8ThutjLtk_oW-eE_lfQx8jJy-y4RdSePwZ_mYC_VYUscjpv3nRLwb-8M40FDm7DziPtPinzP29nD_unyq1pvH1fJuXSXpmlJZBxoNBfCgCUMrldGeKFJwMVoMpm2BGm8CaEAXGh3IegS0qHzXBalm7ObUTUS0O0ypx-m4O31TP181RgQ</recordid><startdate>2001</startdate><enddate>2001</enddate><creator>Mitsutake, K.</creator><creator>Ushiku, Y.</creator><creator>Arakawa, Y.</creator><creator>Ishibumi, T.</creator><creator>Ito, O.</creator><general>IEEE</general><scope>6IE</scope><scope>6IH</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIO</scope></search><sort><creationdate>2001</creationdate><title>New method of extraction of systematic failure component</title><author>Mitsutake, K. ; Ushiku, Y. ; Arakawa, Y. ; Ishibumi, T. ; Ito, O.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i172t-6794a5ed9894eadb13548eefed7ff6ad5bb9e285d949a7d24de68a9a6a38ccd13</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2001</creationdate><topic>Histograms</topic><topic>History</topic><topic>Indium tin oxide</topic><topic>Manufacturing processes</topic><topic>Optimization methods</topic><topic>Production</topic><topic>Productivity</topic><topic>Redundancy</topic><topic>Semiconductor device manufacture</topic><topic>Virtual manufacturing</topic><toplevel>online_resources</toplevel><creatorcontrib>Mitsutake, K.</creatorcontrib><creatorcontrib>Ushiku, Y.</creatorcontrib><creatorcontrib>Arakawa, Y.</creatorcontrib><creatorcontrib>Ishibumi, T.</creatorcontrib><creatorcontrib>Ito, O.</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan (POP) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE Electronic Library (IEL)</collection><collection>IEEE Proceedings Order Plans (POP) 1998-present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Mitsutake, K.</au><au>Ushiku, Y.</au><au>Arakawa, Y.</au><au>Ishibumi, T.</au><au>Ito, O.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>New method of extraction of systematic failure component</atitle><btitle>2001 IEEE International Symposium on Semiconductor Manufacturing. 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language | eng |
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subjects | Histograms History Indium tin oxide Manufacturing processes Optimization methods Production Productivity Redundancy Semiconductor device manufacture Virtual manufacturing |
title | New method of extraction of systematic failure component |
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