A Compact Model for Nanowire Tunneling-FETs

The nanowire gate-all-around structure with the ultimate channel electrostatic integrity exhibits the best immunity to short channel effects and improved scaling capability compared with other multigate structures. In this article, both the tunneling current and capacitance models are developed simu...

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Veröffentlicht in:IEEE transactions on electron devices 2022-01, Vol.69 (1), p.419-426
Hauptverfasser: Lu, Bin, Wang, Dawei, Cui, Yan, Li, Zhu, Chai, Guoqiang, Dong, Linpeng, Zhou, Jiuren, Wang, Guilei, Miao, Yuanhao, Lv, Zhijun, Lu, Hongliang
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Sprache:eng
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Zusammenfassung:The nanowire gate-all-around structure with the ultimate channel electrostatic integrity exhibits the best immunity to short channel effects and improved scaling capability compared with other multigate structures. In this article, both the tunneling current and capacitance models are developed simultaneously for nanowire tunneling field-effect transistors (FETs). Based on the same surface potential model, the developed current model and capacitance model share the common parameters and therefore can be easily integrated as a complete model for circuit-level simulations. Moreover, there is no iterative process involved during the model derivation indicating the models would be efficient for circuit simulations. The proposed models are also implemented into a circuit simulator with SPICE net-list to simulate the inverter, NAND, and NOR gates. Correct circuit behaviors obtained validate the model compatibility with the SPICE platform and usefulness for the further investigation of nanowire-based tunnel FET (TFET) circuits.
ISSN:0018-9383
1557-9646
DOI:10.1109/TED.2021.3123933