Al/sub 2/O/sub 3/ layers for microelectronic applications
Summary form only given. The investigations concern Al/sub 2/O/sub 3/ layers produced by the reactive pulse plasma (RPP) method on semiconductor substrates (Si, SiC). The layers have been investigated both in terms of structure and electrophysical properties. We have developed a technology for produ...
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| creator | Dusinski, E. Szmidt, J. Zdunek, K. Elert, M. Barcz, A. |
| description | Summary form only given. The investigations concern Al/sub 2/O/sub 3/ layers produced by the reactive pulse plasma (RPP) method on semiconductor substrates (Si, SiC). The layers have been investigated both in terms of structure and electrophysical properties. We have developed a technology for producing MIS transistors with these layers as dielectrics, and the electrical parameters of the transistors have been defined. |
| doi_str_mv | 10.1109/WBL.2001.946602 |
| format | Conference Proceeding |
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The investigations concern Al/sub 2/O/sub 3/ layers produced by the reactive pulse plasma (RPP) method on semiconductor substrates (Si, SiC). The layers have been investigated both in terms of structure and electrophysical properties. We have developed a technology for producing MIS transistors with these layers as dielectrics, and the electrical parameters of the transistors have been defined.</description><identifier>ISBN: 9780780371361</identifier><identifier>ISBN: 0780371364</identifier><identifier>DOI: 10.1109/WBL.2001.946602</identifier><language>eng</language><publisher>IEEE</publisher><subject>Chemicals ; Dielectric substrates ; Mass spectroscopy ; Microelectronics ; Plasma applications ; Plasma materials processing ; Plasma properties ; Silicon carbide ; Threshold voltage ; Wet etching</subject><ispartof>3rd International Conference 'Novel Applications of Wide Bandgap Layers' Abstract Book (Cat. 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| identifier | ISBN: 9780780371361 |
| ispartof | 3rd International Conference 'Novel Applications of Wide Bandgap Layers' Abstract Book (Cat. No.01EX500), 2001, p.193-194 |
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| language | eng |
| recordid | cdi_ieee_primary_946602 |
| source | IEEE Electronic Library (IEL) Conference Proceedings |
| subjects | Chemicals Dielectric substrates Mass spectroscopy Microelectronics Plasma applications Plasma materials processing Plasma properties Silicon carbide Threshold voltage Wet etching |
| title | Al/sub 2/O/sub 3/ layers for microelectronic applications |
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