Control design for a 6 DOF e-beam lithography stage

A six DOF stage has been designed to execute the smooth, predictable motion of a wafer required for high-resolution, multiple-electron beam lithography and in-line wafer inspection. Control and metrology system requirements have been achieved through realistic control engineering practice using line...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Pai-Hsueh Yang, Alamo, B., Andeen, G.B.
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Acceleration Control design Control engineering Control systems Error correction Gravity Inspection Linear feedback control systems Lithography Metrology
Online-Zugang:	Volltext bestellen
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