Control design for a 6 DOF e-beam lithography stage

Control design for a 6 DOF e-beam lithography stage

A six DOF stage has been designed to execute the smooth, predictable motion of a wafer required for high-resolution, multiple-electron beam lithography and in-line wafer inspection. Control and metrology system requirements have been achieved through realistic control engineering practice using line...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Pai-Hsueh Yang, Alamo, B., Andeen, G.B.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Acceleration
Control design
Control engineering
Control systems
Error correction
Gravity
Inspection
Linear feedback control systems
Lithography
Metrology
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Beschreibung
Zusammenfassung:A six DOF stage has been designed to execute the smooth, predictable motion of a wafer required for high-resolution, multiple-electron beam lithography and in-line wafer inspection. Control and metrology system requirements have been achieved through realistic control engineering practice using linear feedback, acceleration feedforward, gravity compensation, repetitive control, and error prediction.
ISSN:0743-1619
2378-5861
DOI:10.1109/ACC.2001.946086