Control design for a 6 DOF e-beam lithography stage
A six DOF stage has been designed to execute the smooth, predictable motion of a wafer required for high-resolution, multiple-electron beam lithography and in-line wafer inspection. Control and metrology system requirements have been achieved through realistic control engineering practice using line...
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| creator | Pai-Hsueh Yang Alamo, B. Andeen, G.B. |
| description | A six DOF stage has been designed to execute the smooth, predictable motion of a wafer required for high-resolution, multiple-electron beam lithography and in-line wafer inspection. Control and metrology system requirements have been achieved through realistic control engineering practice using linear feedback, acceleration feedforward, gravity compensation, repetitive control, and error prediction. |
| doi_str_mv | 10.1109/ACC.2001.946086 |
| format | Conference Proceeding |
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(Cat. No.01CH37148)</btitle><stitle>ACC</stitle><date>2001</date><risdate>2001</risdate><volume>3</volume><spage>2255</spage><epage>2260 vol.3</epage><pages>2255-2260 vol.3</pages><issn>0743-1619</issn><eissn>2378-5861</eissn><isbn>9780780364950</isbn><isbn>0780364953</isbn><abstract>A six DOF stage has been designed to execute the smooth, predictable motion of a wafer required for high-resolution, multiple-electron beam lithography and in-line wafer inspection. Control and metrology system requirements have been achieved through realistic control engineering practice using linear feedback, acceleration feedforward, gravity compensation, repetitive control, and error prediction.</abstract><pub>IEEE</pub><doi>10.1109/ACC.2001.946086</doi></addata></record> |
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| identifier | ISSN: 0743-1619 |
| ispartof | Proceedings of the 2001 American Control Conference. (Cat. No.01CH37148), 2001, Vol.3, p.2255-2260 vol.3 |
| issn | 0743-1619 2378-5861 |
| language | eng |
| recordid | cdi_ieee_primary_946086 |
| source | IEEE Electronic Library (IEL) Conference Proceedings |
| subjects | Acceleration Control design Control engineering Control systems Error correction Gravity Inspection Linear feedback control systems Lithography Metrology |
| title | Control design for a 6 DOF e-beam lithography stage |
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