Chemical-solution processing and patterning of integrated ferroelectrics

Chemical-solution processing and patterning of integrated ferroelectrics

In this paper we report the chemical-solution processing of dense insulating ferroelectric thin layers with emphasis on the patterning of device structures. A review is presented for a wide range of patterning techniques and details are reported for new additive methods that appear suited for ferroe...

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Hauptverfasser: Mikalsen, E.A., Payne, D.A., Clem, P.G.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Chemical processes
Ferroelectric materials
Insulation
Laboratories
Lead compounds
Optical materials
Polarization
Residual stresses
Substrates
Thermal stresses
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creator Mikalsen, E.A.
Payne, D.A.
Clem, P.G.
description In this paper we report the chemical-solution processing of dense insulating ferroelectric thin layers with emphasis on the patterning of device structures. A review is presented for a wide range of patterning techniques and details are reported for new additive methods that appear suited for ferroelectric applications.
doi_str_mv 10.1109/ISAF.2000.941502
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identifier ISSN: 1099-4734
ispartof ISAF 2000. Proceedings of the 2000 12th IEEE International Symposium on Applications of Ferroelectrics (IEEE Cat. No.00CH37076), 2000, Vol.1, p.5-10 vol. 1
issn 1099-4734
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source IEEE Electronic Library (IEL) Conference Proceedings
subjects Chemical processes
Ferroelectric materials
Insulation
Laboratories
Lead compounds
Optical materials
Polarization
Residual stresses
Substrates
Thermal stresses
title Chemical-solution processing and patterning of integrated ferroelectrics
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