Chemical-solution processing and patterning of integrated ferroelectrics

Chemical-solution processing and patterning of integrated ferroelectrics

In this paper we report the chemical-solution processing of dense insulating ferroelectric thin layers with emphasis on the patterning of device structures. A review is presented for a wide range of patterning techniques and details are reported for new additive methods that appear suited for ferroe...

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Bibliographische Detailangaben
Hauptverfasser: Mikalsen, E.A., Payne, D.A., Clem, P.G.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Chemical processes
Ferroelectric materials
Insulation
Laboratories
Lead compounds
Optical materials
Polarization
Residual stresses
Substrates
Thermal stresses
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Beschreibung
Zusammenfassung:In this paper we report the chemical-solution processing of dense insulating ferroelectric thin layers with emphasis on the patterning of device structures. A review is presented for a wide range of patterning techniques and details are reported for new additive methods that appear suited for ferroelectric applications.
ISSN:1099-4734
2375-0448
DOI:10.1109/ISAF.2000.941502