Design of Dual-Polarized Reflectarray for Near-Field Shaped Focusing

This letter presents a design of reflectarray for near-field (NF) shaped focusing, and a synthesis method is proposed to generate desired shaped pattern in the NF zone. The orthogonally arranged tridipoles structure is used to realize the dual-polarized reflectarray. The unit cell has continuous reflection phase-shift ranges (more than 360°) under x -polarized and y -polarized incident E-fields. A sample reflectarray generating dual-polarized focused patterns is presented to validate the design. Experimental results show that the horizontal component of E-field has the shaped pattern of letter "X," and the vertical component of E-field owns the shaped pattern of letter "Y." Besides, the measured results are in good agreement with the theoretical analyses.