Impact of Read Operation on the Performance of HfO2-Based Ferroelectric FETs

This letter investigates the impact of read operation on the electrical properties of hafnium oxide-based ferroelectric field-effect transistors (FeFETs). We report that a quasi-static read may induce a series of phenomena, including a severe underestimation of the memory window, undesirable loss of...

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Veröffentlicht in:IEEE electron device letters 2020-09, Vol.41 (9), p.1420-1423
Hauptverfasser: Mulaosmanovic, Halid, Dunkel, Stefan, Muller, Johannes, Trentzsch, Martin, Beyer, Sven, Breyer, Evelyn T., Mikolajick, Thomas, Slesazeck, Stefan
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Sprache:eng
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Zusammenfassung:This letter investigates the impact of read operation on the electrical properties of hafnium oxide-based ferroelectric field-effect transistors (FeFETs). We report that a quasi-static read may induce a series of phenomena, including a severe underestimation of the memory window, undesirable loss of the stored state, i.e. destructive read, increased variability and an apparent steep-slope behavior with a subthreshold slope lower than 7 mV/decade, which are not present under a fast read. We explain the results with the time-voltage dependence for the ferroelectric switching. Based on this, we provide comprehensive yet essential guidelines for disturb-free write and read operations.
ISSN:0741-3106
1558-0563
DOI:10.1109/LED.2020.3007220