Chemically assisted nitrogen ion beam etching of polymeric optical waveguide

Chemically assisted nitrogen ion beam etching of polymeric optical waveguide

Summary form only. We fabricated PMMA optical waveguides by conventional photolithographic and dry etching processes. The influence of process parameters such as gas composition, kinetic energy of the ion and sample temperatures was investigated in detail in order to discuss the dry etching mechanis...

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Hauptverfasser: Taguchi, K., Ueguchi, T., Ikeda, M.
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Sprache:eng ; jpn
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Chemicals
Etching
Ion beams
Nitrogen
Optical polymers
Optical waveguides
Particle beam optics
Slabs
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creator Taguchi, K.
Ueguchi, T.
Ikeda, M.
description Summary form only. We fabricated PMMA optical waveguides by conventional photolithographic and dry etching processes. The influence of process parameters such as gas composition, kinetic energy of the ion and sample temperatures was investigated in detail in order to discuss the dry etching mechanism of polymer which consists of C-H-O bands.
doi_str_mv 10.1109/CLEOE.2000.910020
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source IEEE Electronic Library (IEL) Conference Proceedings
subjects Chemicals
Etching
Ion beams
Nitrogen
Optical polymers
Optical waveguides
Particle beam optics
Slabs
title Chemically assisted nitrogen ion beam etching of polymeric optical waveguide
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