Chemically assisted nitrogen ion beam etching of polymeric optical waveguide

Chemically assisted nitrogen ion beam etching of polymeric optical waveguide

Summary form only. We fabricated PMMA optical waveguides by conventional photolithographic and dry etching processes. The influence of process parameters such as gas composition, kinetic energy of the ion and sample temperatures was investigated in detail in order to discuss the dry etching mechanis...

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Bibliographische Detailangaben
Hauptverfasser: Taguchi, K., Ueguchi, T., Ikeda, M.
Format: Tagungsbericht
Sprache:eng ; jpn
Schlagworte:
Chemicals
Etching
Ion beams
Nitrogen
Optical polymers
Optical waveguides
Particle beam optics
Slabs
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Beschreibung
Zusammenfassung:Summary form only. We fabricated PMMA optical waveguides by conventional photolithographic and dry etching processes. The influence of process parameters such as gas composition, kinetic energy of the ion and sample temperatures was investigated in detail in order to discuss the dry etching mechanism of polymer which consists of C-H-O bands.
DOI:10.1109/CLEOE.2000.910020