A 180-nm X-Band Cryogenic CMOS LNA
This letter presents the measurement results of a 180-nm complementary metal-oxide-semiconductor (CMOS) X -band low-noise amplifier (LNA) at both 77 and 300 K. The designed LNA provides S_{11} and S_{22} below −10 dB at both temperatures within 6.4-7.4 GHz band. At 300 K, the voltage gain of th...
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Veröffentlicht in: | IEEE microwave and wireless components letters 2020-04, Vol.30 (4), p.395-398 |
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Sprache: | eng |
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Zusammenfassung: | This letter presents the measurement results of a 180-nm complementary metal-oxide-semiconductor (CMOS) X -band low-noise amplifier (LNA) at both 77 and 300 K. The designed LNA provides S_{11} and S_{22} below −10 dB at both temperatures within 6.4-7.4 GHz band. At 300 K, the voltage gain of the designed LNA is higher than 12.5 dB, and it provides an average noise temperature of 275 K, as well as −1 dBm IIP3. At 77 K, the LNA has approximately an 18-dB voltage gain, 78-K noise figure (NF), and −3 dBm IIP3. The presented work is the first implemented X -band cryogenic CMOS LNA in the literature. |
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ISSN: | 1531-1309 2771-957X 1558-1764 2771-9588 |
DOI: | 10.1109/LMWC.2020.2979341 |