Improved electrical characteristics in deep submicron bipolar transistors with low thermal budget in-situ phosphorus doped single-crystal silicon emitters

The electrical characteristics of deep submicron bipolar transistors incorporating low thermal budget in-situ phosphorus doped single crystal silicon emitters are reported. This type of transistor exhibits a very ideal base current ideality factor and low emitter resistance. The use of in-situ phosp...

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Hauptverfasser: Abdul-Rahim, A.I., Marsh, C.D., Nash, G.R., Mitchell, M., Booker, G.R., Ashburn, P.
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Marsh, C.D.
Nash, G.R.
Mitchell, M.
Booker, G.R.
Ashburn, P.
description The electrical characteristics of deep submicron bipolar transistors incorporating low thermal budget in-situ phosphorus doped single crystal silicon emitters are reported. This type of transistor exhibits a very ideal base current ideality factor and low emitter resistance. The use of in-situ phosphorus doping is shown to eliminate the degradation of electrical characteristics seen in small geometry transistors due to emitter plug effects.
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source IEEE Electronic Library (IEL) Conference Proceedings
subjects Application specific processors
Bipolar transistors
Doping
Electric resistance
Electric variables
Geometry
Plugs
Silicon
Thermal degradation
Thermal resistance
title Improved electrical characteristics in deep submicron bipolar transistors with low thermal budget in-situ phosphorus doped single-crystal silicon emitters
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