Materials Informatics for Process and Material Co-Optimization

In semiconductor manufacturing, fabrication processes and their materials should be properly co-optimized to achieve required processing results within reasonable development duration and acceptable cost. Unfortunately, it is a very time-consuming procedure, because the number of possible combinations of process/material candidates is very large. Here, we develop a methodology for co-optimization of processes and their materials. We successfully constructed a prediction model for dry-etching of high-k materials (R 2 = 0.65). Also, it was proven that considering both the materials and processes is needed for accurate prediction of etching rates. By trying only