Bulk-Like Dynamic Magnetic Properties of Nickel Ferrite Epitaxial Thin Films Grown on SrTiO3(001) Substrates

Bulk-Like Dynamic Magnetic Properties of Nickel Ferrite Epitaxial Thin Films Grown on SrTiO3(001) Substrates

Nickel ferrite (NiFe 2 O 4 , NFO) films were grown at high temperatures on SrTiO 3 (001) substrates using laser molecular beam epitaxy. A spinel lattice structure, with lattice parameters close to those of bulk NFO, was confirmed by electron and X-ray diffraction. Vibrating sample magnetometer measu...

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Veröffentlicht in:IEEE magnetics letters 2019, Vol.10, p.1-5
Hauptverfasser: Bursian, Viktor E., Kaveev, Andrey K., Korovin, Alexander M., Krichevtsov, Boris B., Lutsev, Leonid V., Suturin, Sergey M., Sawada, Masahiro, Sokolov, Nikolai S.
Format: Artikel
Sprache:eng
Schlagworte:
Absorption
Anisotropy
Crystals
Dependence
Dichroism
Epitaxial growth
Ferromagnetic resonance
Ferromagnetism
Hysteresis loops
Laser beams
laser molecular beam epitaxy
Lattice parameters
Magnetic anisotropy
Magnetic properties
Magnetism
Magnetization
Magnetometers
Molecular beam epitaxy
Molecular structure
Nanomagnetics
Nickel
nickel ferrite epitaxial films
Nickel ferrites
Reflection
Soft x rays
Spinel
Strontium titanates
Substrates
Superhigh frequencies
Thin films
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Zusammenfassung:Nickel ferrite (NiFe 2 O 4 , NFO) films were grown at high temperatures on SrTiO 3 (001) substrates using laser molecular beam epitaxy. A spinel lattice structure, with lattice parameters close to those of bulk NFO, was confirmed by electron and X-ray diffraction. Vibrating sample magnetometer measurements show an in-plane remanent magnetization, relatively narrow (~50 Oe) hysteresis loops, and fourfold symmetry. Soft X-ray magnetic dichroism measurements indicate an inverse spinel structure. X-band ferromagnetic resonance (FMR) measurements show a line width as low as 45-50 Oe, which corresponds to the value for bulk NFO crystals. The angular dependence of FMR on a 110 nm thick NFO film indicates cubic anisotropy close to that of bulk crystals and a substrate-induced stress anisotropy field of about 0.4 kG.
ISSN:1949-307X
1949-3088
DOI:10.1109/LMAG.2019.2930597