The Demonstration of High-Performance Multilayer BaTiO3/BiFeO3 Stack MIM Capacitors
Multilayer BaTiO 3 /BiFeO 3 (BTO/BFO) stack structures were prepared on the Pt/TiO 2 /SiO 2 /Si (100) substrate via highly accurate magnetron sputtering process. The cubic to the tetragonal phase transition of BTO was confirmed by both the X-ray diffraction and Raman spectroscopy after the process o...
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Veröffentlicht in: | IEEE transactions on electron devices 2018-11, Vol.65 (11), p.4834-4838 |
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Sprache: | eng |
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Zusammenfassung: | Multilayer BaTiO 3 /BiFeO 3 (BTO/BFO) stack structures were prepared on the Pt/TiO 2 /SiO 2 /Si (100) substrate via highly accurate magnetron sputtering process. The cubic to the tetragonal phase transition of BTO was confirmed by both the X-ray diffraction and Raman spectroscopy after the process of rapid thermal anneal. An ~74.1% increase of the relative permittivity was observed with the increasing thickness of BFO in the metal-insulator-metal capacitor. On the other hand, we also demonstrate that the leakage current density and the relative permittivity are found to have 20-50 times reduction and 26.6% improvement, respectively, with the additional cap of the BTO layer. |
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ISSN: | 0018-9383 1557-9646 |
DOI: | 10.1109/TED.2018.2868849 |