Enhanced Sheet Charge Density in DIBS Grown CdO Alloyed ZnO Buffer Based Heterostructure
In this letter, we report on achieving significantly high (~ 6{\times} ) sheet charge density (n s ) in MgZnO/CdZnO heterostructure, as compared with that in MgZnO/ZnO, at lower Mg ( {\le} 0.15 ) compositions in barrier MgZnO layer, with both heterostructures grown by dual ion beam sputtering techni...
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Veröffentlicht in: | IEEE electron device letters 2018-06, Vol.39 (6), p.827-830 |
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Sprache: | eng |
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Zusammenfassung: | In this letter, we report on achieving significantly high (~ 6{\times} ) sheet charge density (n s ) in MgZnO/CdZnO heterostructure, as compared with that in MgZnO/ZnO, at lower Mg ( {\le} 0.15 ) compositions in barrier MgZnO layer, with both heterostructures grown by dual ion beam sputtering technique. Buffer CdZnO and barrier MgZnO layers are probed separately to investigate carrier density in defect prone sputtered layers. Capacitance-voltage measurement and temperature-dependent Hall measurement confirm the presence of quantum confined carrier density at barrier-buffer interface, suggesting that the enhancement in carrier densities in the heterostructure over individual layers is probably due to the formation of 2-D electron gas (2-DEG). |
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ISSN: | 0741-3106 1558-0563 |
DOI: | 10.1109/LED.2018.2829761 |