The effect of thermal annealing on the properties of polysilicon piezoresistors

Polycrystalline silicon offers promise as a pressure sensor material, especially for extended temperature range applications. The investigation of the dependencies of polysilicon layers' physical properties on deposition and annealing parameters is the aim of this work.

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Hauptverfasser: Gridchin, V.A., Grischenko, V.V., Loganihin, A.M., Lubimsky, V.M.
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creator Gridchin, V.A.
Grischenko, V.V.
Loganihin, A.M.
Lubimsky, V.M.
description Polycrystalline silicon offers promise as a pressure sensor material, especially for extended temperature range applications. The investigation of the dependencies of polysilicon layers' physical properties on deposition and annealing parameters is the aim of this work.
doi_str_mv 10.1109/MIAME.1999.827838
format Conference Proceeding
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source IEEE Electronic Library (IEL) Conference Proceedings
subjects Annealing
Argon
Conductivity
Doping
Ion implantation
Piezoresistive devices
Silicon
Stability
Temperature dependence
Virtual reality
title The effect of thermal annealing on the properties of polysilicon piezoresistors
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