Thin film deposition of BST by pulsed ion beam evaporation

Ablation plasma generated by an intense, pulsed ion beam was used for thin-film deposition of commercially interesting materials such as (Ba/sub x/, Sr/sub 1-x/)TiO/sub 3/. The deposition has been carried out in vacuum and with the substrate at room temperature. The deposited thin films were analyze...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Yatsui, K., Ohtomo, K., Jiang, W.
Format:	Tagungsbericht
Sprache:	eng
Schlagworte:	Binary search trees Ion beams Plasma applications Plasma materials processing Plasma temperature Pulse generation Sputtering Strontium Substrates X-ray scattering
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