Thin film deposition of BST by pulsed ion beam evaporation

Thin film deposition of BST by pulsed ion beam evaporation

Ablation plasma generated by an intense, pulsed ion beam was used for thin-film deposition of commercially interesting materials such as (Ba/sub x/, Sr/sub 1-x/)TiO/sub 3/. The deposition has been carried out in vacuum and with the substrate at room temperature. The deposited thin films were analyze...

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Bibliographische Detailangaben
Hauptverfasser: Yatsui, K., Ohtomo, K., Jiang, W.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
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Ion beams
Plasma applications
Plasma materials processing
Plasma temperature
Pulse generation
Sputtering
Strontium
Substrates
X-ray scattering
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Beschreibung
Zusammenfassung:Ablation plasma generated by an intense, pulsed ion beam was used for thin-film deposition of commercially interesting materials such as (Ba/sub x/, Sr/sub 1-x/)TiO/sub 3/. The deposition has been carried out in vacuum and with the substrate at room temperature. The deposited thin films were analyzed by using RES, AFM, SEM and XRD. The analytical results have shown that this deposition technique is applicable to many kinds of materials with very high deposition rate and low cost.
DOI:10.1109/PPC.1999.825436