An Analytical Model of Gate-All-Around Heterojunction Tunneling FET

A compact analytical drain current model considering the inversion layer and source depletion is developed for the gate-all-around (GAA) heterojunction tunneling FET (H-TFET) with staggered-gap alignment. Poisson's equations are solved to obtain the continuous surface potential profile for the...

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Veröffentlicht in:IEEE transactions on electron devices 2018-02, Vol.65 (2), p.776-782
Hauptverfasser: Guan, Yunhe, Li, Zunchao, Zhang, Wenhao, Zhang, Yefei, Liang, Feng
Format: Artikel
Sprache:eng
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Zusammenfassung:A compact analytical drain current model considering the inversion layer and source depletion is developed for the gate-all-around (GAA) heterojunction tunneling FET (H-TFET) with staggered-gap alignment. Poisson's equations are solved to obtain the continuous surface potential profile for the GAA H-TFET first, then the drain current is derived based on Kane's model by using the tangent line approximation method, and finally, the model is verified by TCAD simulation using GaAs 0.5 Sb 0.5 /In 0.53 Ga 0.47 As GAA H-TFET and published data. The impacts of bias, gate oxide dielectric constant, and interface fixed charge on the surface potential, electric field, and {I} _{{\textsf {DS}}} - {V} _{{\textsf {GS}}} can be well predicted by the proposed model. The super-linear onset and saturation characteristics of {I} _{{\textsf {DS}}} - {V} _{{\textsf {DS}}} curves are also obtained.
ISSN:0018-9383
1557-9646
DOI:10.1109/TED.2017.2783911