Plane wave transmission response of selectively doped and micromachined silicon wafers under optical illumination

Plane wave transmission response of selectively doped and micromachined silicon wafers under optical illumination

The optical manipulation of the transmission properties of selectively doped and micromachined silicon wafers is described. This is achieved by means of optically exciting the silicon and inducing pseudo-conducting plasma. Comparisons between theory and experiment are made and consideration is made...

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Bibliographische Detailangaben
Hauptverfasser: Lockyer, D.S., Vardaxoglou, J.C., Kearney, M.J.
Format: Tagungsbericht
Sprache:eng
Schlagworte:
Apertures
Etching
Frequency selective surfaces
Lighting
Optical arrays
Passband
Plasma applications
Plasma properties
Plasma sources
Silicon
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Beschreibung
Zusammenfassung:The optical manipulation of the transmission properties of selectively doped and micromachined silicon wafers is described. This is achieved by means of optically exciting the silicon and inducing pseudo-conducting plasma. Comparisons between theory and experiment are made and consideration is made of the lossy nature of the plasma.
DOI:10.1109/MWP.1999.819677