Monolithic Three-Dimensional 65-nm CMOS-Nanoelectromechanical Reconfigurable Logic for Sub-1.2-V Operation
Monolithic three-dimensional (M3D) CMOS-nanoelectromechanical (CMOS-NEM) reconfigurable logic (RL) circuits are experimentally demonstrated. This is the first experimental demonstration of 65-nm M3D CMOS-NEM RL circuits satisfying the 1.2-V supply voltage (VDD) requirement of the 65-nm technology no...
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Veröffentlicht in: | IEEE electron device letters 2017-09, Vol.38 (9), p.1317-1320 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | Monolithic three-dimensional (M3D) CMOS-nanoelectromechanical (CMOS-NEM) reconfigurable logic (RL) circuits are experimentally demonstrated. This is the first experimental demonstration of 65-nm M3D CMOS-NEM RL circuits satisfying the 1.2-V supply voltage (VDD) requirement of the 65-nm technology node. The fabrication process is identical to the conventional 65-nm CMOS baseline process, in which copper NEM memory switches are formed by a dual damascene process. |
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ISSN: | 0741-3106 1558-0563 |
DOI: | 10.1109/LED.2017.2726685 |