A high-current density contact ionization source for heavy-ion fusion
Heavy ion fusion (HIF) sources will be low-emittance, high current (0.5-1 A), and suitable for injection into a multiple beam induction linac, where the diameter of each beam aperture at the beginning of the accelerator is 3-6 cm. Practical transport limits involved in matching the beam to the accel...
Gespeichert in:
Hauptverfasser: | , , , , , |
---|---|
Format: | Tagungsbericht |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | Heavy ion fusion (HIF) sources will be low-emittance, high current (0.5-1 A), and suitable for injection into a multiple beam induction linac, where the diameter of each beam aperture at the beginning of the accelerator is 3-6 cm. Practical transport limits involved in matching the beam to the accelerator aperture in a reasonably-sized structure correspond to several mA/cm/sup 2/ of space charge limited flow with an injector extraction voltage of 1-2.5 MV. We have built a J/spl ap/8 mA/cm/sup 2/ Cs/sup +/ contact ionization source for a 160 kV diode; this represents a factor of four increase in the Cs/sup +/ current density over previous sources for HIF. The emitter is sintered iridium, operating at 950 |
---|---|
DOI: | 10.1109/PAC.1999.792959 |