A 185-215-GHz Subharmonic Resistive Graphene FET Integrated Mixer on Silicon
A 200-GHz integrated resistive subharmonic mixer based on a single chemical vapor deposition graphene field-effect transistor (G-FET) is demonstrated experimentally. This device has a gate length of 0.5 μm and a gate width of 2 × 40 μm. The G-FET channel is patterned into an array of bow-tie-shaped...
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Veröffentlicht in: | IEEE transactions on microwave theory and techniques 2017-01, Vol.65 (1), p.165-172 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | A 200-GHz integrated resistive subharmonic mixer based on a single chemical vapor deposition graphene field-effect transistor (G-FET) is demonstrated experimentally. This device has a gate length of 0.5 μm and a gate width of 2 × 40 μm. The G-FET channel is patterned into an array of bow-tie-shaped nanoconstrictions, resulting in the device impedance levels of ~50 Ω and the ON-OFF ratios of ≥4. The integrated mixer circuit is implemented in coplanar waveguide technology and realized on a 100-μm-thick highly resistive silicon substrate. The mixer conversion loss is measured to be 29 ± 2 dB across the 185-210-GHz band with 12.5-11.5 dBm of local oscillator (LO) pump power and >15-dB LO-RF isolation. The estimated 3-dB IF bandwidth is 15 GHz. |
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ISSN: | 0018-9480 1557-9670 1557-9670 |
DOI: | 10.1109/TMTT.2016.2615928 |