A 185-215-GHz Subharmonic Resistive Graphene FET Integrated Mixer on Silicon

A 200-GHz integrated resistive subharmonic mixer based on a single chemical vapor deposition graphene field-effect transistor (G-FET) is demonstrated experimentally. This device has a gate length of 0.5 μm and a gate width of 2 × 40 μm. The G-FET channel is patterned into an array of bow-tie-shaped...

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Veröffentlicht in:IEEE transactions on microwave theory and techniques 2017-01, Vol.65 (1), p.165-172
Hauptverfasser: Andersson, Michael A., Yaxin Zhang, Stake, Jan
Format: Artikel
Sprache:eng
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Zusammenfassung:A 200-GHz integrated resistive subharmonic mixer based on a single chemical vapor deposition graphene field-effect transistor (G-FET) is demonstrated experimentally. This device has a gate length of 0.5 μm and a gate width of 2 × 40 μm. The G-FET channel is patterned into an array of bow-tie-shaped nanoconstrictions, resulting in the device impedance levels of ~50 Ω and the ON-OFF ratios of ≥4. The integrated mixer circuit is implemented in coplanar waveguide technology and realized on a 100-μm-thick highly resistive silicon substrate. The mixer conversion loss is measured to be 29 ± 2 dB across the 185-210-GHz band with 12.5-11.5 dBm of local oscillator (LO) pump power and >15-dB LO-RF isolation. The estimated 3-dB IF bandwidth is 15 GHz.
ISSN:0018-9480
1557-9670
1557-9670
DOI:10.1109/TMTT.2016.2615928