Channel length dependence of hot-carrier degradation of LATID-n-MOSFETs under analog operation

We investigate the hot-carrier degradation of large angle tilted implementation drain n-MOSFETs (LATID-n-MOSFETs) using specific stress techniques related to the operating conditions of analog CMOS applications. Under these conditions, we find a hot-carrier induced damage proportional to the inverse...

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Hauptverfasser: Thewes, R., Walter, G.H., Brederlow, R., Schlunder, C., von Schwerin, A., Jurk, R., Linnenbank, C.G., Lengauer, G., Schmitt-Landsiedel, D., Weber, W.
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Sprache:eng
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